Ultra Fast Elemental Depth Profiling with the New Gd-profiler 2.

RF Glow Discharge Optical Emission Spectrometry provides quantitative depth profiles from the first
atomic layers down to the bulk (more than 150 microns) with sputtering rates typically 1000 times
faster than other surface techniques, say Horiba Jobin Yvon.

Having a large variety of applications?
See what the flexibility of the OES design, the RF source, the speed of analysis and the large sample
chamber could offer to efficiently run all sorts of materials, bulk or coated, conductive or not.

Interested in Surface Analysis?
Published examples of a depth resolution below the nanometre reveal the capability of the RF GD
technique. See what the pulse mode could do on ultra thin fragile or thermal sensitive materials (PbZrTi, thin coated glasses, polymers).

Controlling PCD/CVD, galvanized steels, oxide films etc, or studying corrosion mechanisms?
The instrument is compliant with the ISO 14707 and ISO 16962 standards and ideal for coating process characterisation and control.