• High-Pressure Ion Chromatography - The Next Evolution in IC

Chromatography

High-Pressure Ion Chromatography - The Next Evolution in IC

Jul 03 2013

Thermo Scientific™ Dionex™ HPIC™ systems redefine the way ion chromatography is performed due to their continuous operation up to 5000 psi when configured as a Reagent-Free™ (RFIC™) system. This feature allows the use of new high-efficiency 4 μm particle-size columns which provide better performance, fast run times using 150 mm columns, and high resolution using 250 mm columns. View our latest HPIC webinars, white papers and interviews with our experts.

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The Dionex ICS-5000+ HPIC is the first system with an all-PEEK flow path capable of operating continuously at 5000 psi. Reagent-Free HPIC systems redefine the way ion chromatography is performed. High backpressure tolerance lets you increase flow rates to maximize your throughput while still benefiting from the advantages of electrolytic eluent generation and suppression. Sensitivity, resolution, and ease-of-use are taken to a whole new level, simplifying ion chromatography while simultaneously increasing the power and reproducibility of ion analysis. High resolution and fast run times are achievable using new high-efficiency 4 µm columns. Choose between isocratic or electrolytic gradient separations to optimize peak resolution.

The Dionex ICS-5000+ HPIC system represents the next step in the evolution of ion chromatography.

The Dionex ICS-4000 capillary HPIC system delivers best-in-class sensitivity, from routine analyses to your most demanding application challenges. The high-pressure capability brings a new level of resolution and speed to dedicated capillary ion chromatography, while integrated design of the Dionex ICS-4000 simplifies your workflow and increases your analytical efficiency and productivity.

Capillary IC provides 24/7 uptime so the system is always ready. The compact integrated system provides convenience and offers detection choices for application versatility.

Visit our Ion Chromatography Resource Center>>


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